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1

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Shot noise, LER, and quantum efficiency of EUV photoresists

Brainard, Robert L., Trefonas, Peter, Lammers, Jeroen H., Cutler, Charlotte A., Mackevich, Joseph F., Trefonas, Alexander, Robertson, Stewart A., Mackay, R. Scott

Year:

2004

Language:

english

File:

PDF, 557 KB

english, 2004

2

Bottom-up/top-down, high-resolution, high-throughput lithography using vertically assembled block bottle brush polymers

Trefonas, Peter, Thackeray, James W., Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V., Eller, Michael J., Li, Ang, Pavia-Sanders, Adriana, Schweikert, Emile A., Wooley, Karen L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 8.66 MB

english, 2013

3

Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials

Sun, Guorong, Cho, Sangho, Yang, Fan, He, Xun, Pavía-Sanders, Adriana, Clark, Corrie, Raymond, Jeffery E., Verkhoturov, Stanislav V., Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

2015

Language:

english

File:

PDF, 807 KB

english, 2015

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Graphoepitaxial and chemoepitaxial methods for creating line-space patterns at 33nm pitch: comparison to a HVM process

Resnick, Douglas J., Bencher, Christopher, Millward, Dan B., Lugani, Gurpreet S., Light, Scott L., Niroomand, Ardavan, Hustad, Phillip D., Trefonas, Peter, Quach, Dung, Ginzburg, Valeriy V.

Year:

2015

Language:

english

File:

PDF, 686 KB

english, 2015

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Blob defect prevention in 193nm topcoat-free immersion lithography

Wang, Deyan, Liu, Jinrong, Kang, Doris, Liu, Cong, Estelle, Tom, Xu, Cheng-Bai, Barclay, George, Trefonas, Peter, Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 1003 KB

english, 2012

6

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Acid diffusion, standing waves, and information theory: a molecular-scale model of chemically amplified resist

Trefonas III, Peter, Allen, Mary T., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 1.12 MB

english, 1992

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Materials for single-etch double patterning process: surface curing agent and thermal cure resist

Bae, Young C., Henderson, Clifford L., Liu, Yi, Cardolaccia, Thomas, McDermott, John C., Trefonas, Peter, Spizuoco, Ken, Reilly, Michael, Pikon, Amandine, Joesten, Lori, Zhang, Gary G., Barclay, Georg

Year:

2009

Language:

english

File:

PDF, 823 KB

english, 2009

8

Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin

Wang, Deyan, Caporale, Stefan, Audes, Cecily, Cheon, Kap-Soo, Xu, Cheng Bai, Trefonas, Peter, Barclay, George

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 965 KB

english, 2007

9

Designing Block Copolymers for Nanolithography using Mesoscale Modeling: Line-Space Graphoepitaxy

Ginzburg, Valeriy V., Hustad, Phillip D., Millward, Dan B., Trefonas, Peter

Journal:

Year:

2016

File:

PDF, 570 KB

2016

10

Direct Correlation of Single-Particle Motion to Amorphous Microstructural Components of Semicrystalline Poly(ethylene oxide) Electrolytic Films

Roberts, Trevor D., Yuan, Rongfeng, Xiang, Limin, Delor, Milan, Pokhrel, Ravi, Yang, Ke, Aqad, Emad, Marangoni, Tomas, Trefonas, Peter, Xu, Ke, Ginsberg, Naomi S.

Journal:

The Journal of Physical Chemistry Letters

Year:

2020

File:

PDF, 7.82 MB

2020

11

What is the optimum exposure dose for a positive resist containing poly-functional photoactive compound?

Peter Trefonas III, Thomas A. Fisher, Joseph Lachowski

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 451 KB

english, 1991

12

Acid diffusion effects between resists in freezing processes used for contact hole patterning

Jürgen Fuhrmann, André Fiebach, Andreas Erdmann, Peter Trefonas

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 799 KB

english, 2010

13

Organosilane high polymers: Synthesis of formable homopolymers

Peter Trefonas III, Peter I. Djurovich, Xing-Hua Zhang, Robert West, Robert D. Miller, Donald Hofer

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1983

Language:

english

File:

PDF, 188 KB

english, 1983

14

Organosilane high polymers: Electronic spectra and photodegradation

Peter Trefonas III, Robert West, Robert D. Miller, Don Hofer

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1983

Language:

english

File:

PDF, 229 KB

english, 1983

15

Organosilane high polymers: Oxidation of polycyclohexylmethylsilylene

Peter Trefonas III, Robert West

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1985

Language:

english

File:

PDF, 285 KB

english, 1985

16

MOLECULAR PROPERTIES OF THE CHLORINATED ETHYLENES AND THEIR EPOXIDE METABOLITES

Peter Politzer, Peter Trefonas III, Ieva Ruks Politzer, Bradley Elfman

Journal:

Annals of the New York Academy of Sciences

Year:

1981

Language:

english

File:

PDF, 675 KB

english, 1981

17

Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials

Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V., Eller, Michael J., Li, Ang, Pavía-Jiménez, Adriana, Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley, Karen L.

Journal:

Journal of the American Chemical Society

Year:

2013

Language:

english

File:

PDF, 2.92 MB

english, 2013

18

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Surface Tension Effects In Microlithography - Striations

Daniels, Brian K., Szmanda, Charles R., Templeton, Michael K., Trefonas III, Peter, Willson, C. Grant

Year:

1986

Language:

english

File:

PDF, 9.75 MB

english, 1986

19

Spin-On Organic Polymer Dopants for Silicon

Hoarfrost, Megan L., Takei, Kuniharu, Ho, Victor, Heitsch, Andrew, Trefonas, Peter, Javey, Ali, Segalman, Rachel A.

Journal:

The Journal of Physical Chemistry Letters

Year:

2013

Language:

english

File:

PDF, 1.99 MB

english, 2013

20

Organosilane high polymers: thermochromic behavior in solution

Trefonas, Peter., Damewood, James R., West, Robert., Miller, Robert D.

Journal:

Organometallics

Year:

1985

Language:

english

File:

PDF, 232 KB

english, 1985

21

Polysilane high polymers: mechanism of photodegradation

Trefonas, Peter, West, Robert, Miller, Robert D.

Journal:

Journal of the American Chemical Society

Year:

1985

Language:

english

File:

PDF, 815 KB

english, 1985

22

A proposed formula for the energy of an atom in a molecule

Politzer, Peter, Daiker, Kenneth C., Trefonas, Peter

Journal:

The Journal of Chemical Physics

Year:

1979

Language:

english

File:

PDF, 472 KB

english, 1979

23

Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope

Cho, Sangho, Yang, Fan, Sun, Guorong, Eller, Michael J., Clark, Corrie, Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley, Karen L.

Journal:

Macromolecular Rapid Communications

Year:

2014

Language:

english

File:

PDF, 1.20 MB

english, 2014

24

Computational modeling of block-copolymer directed self-assembly

Ginzburg, Valeriy V., Weinhold, Jeffrey D., Trefonas, Peter

Journal:

Journal of Polymer Science Part B: Polymer Physics

Year:

2015

Language:

english

File:

PDF, 452 KB

english, 2015

25

Region specific enhancement of quantum dot emission using interleaved two-dimensional photonic crystals

See, Gloria G., Xu, Lu, Naughton, Matt S., Tang, Tiantian, Bonita, Yolanda, Joo, Jake, Trefonas, Peter, Deshpande, Kishori, Kenis, Paul J. A., Nuzzo, Ralph G., Cunningham, Brian T.

Journal:

Year:

2015

Language:

english

File:

PDF, 563 KB

english, 2015

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Bottom-up/top-down high resolution, high throughput lithography using vertically assembled block bottle brush polymers

Trefonas, Peter, Thackeray, James W., Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V., Eller, Michael J., Li, Ang, Pavía-Jiménez, Adriana, Schweikert, Emile A., Wooley, Karen L., S

Year:

2013

Language:

english

File:

PDF, 3.45 MB

english, 2013

27

[ECS ISTC/CSTIC 2009 (CISTC) - Shanghai, China (March 19 - March 20, 2009)] ECS Transactions - Novel Embedded Barrier Layer Materials for ArF Non-topcoat Immersion Applications

Wang, Deyan, Wu, Chunyi J., Xu, Cheng Bai, Barclay, George, Trefonas, Peter, Xu, Min

Year:

2009

Language:

english

File:

PDF, 1.24 MB

english, 2009

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Impact of materials selection on graphoepitaxial directed self-assembly for line-space patterning

Resnick, Douglas J., Bencher, Christopher, Quach, Dung, Ginzburg, Valeriy V., Li, Mingqi, Wu, Janet, Chang, Shih-wei, Trefonas, Peter, Hustad, Phillip D., Millward, Dan B., Lugani, Gurpreet S., Light,

Year:

2015

Language:

english

File:

PDF, 1.13 MB

english, 2015

29

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Etch resistance: comparison and development of etch rate models

Perret, Damien, Andes, Cecily E., Cheon, Kap-Soo, Sobhian, Mani, Szmanda, Charles R., Barclay, George G., Trefonas, Peter, Lin, Qinghuang

Year:

2007

Language:

english

File:

PDF, 339 KB

english, 2007

30

Orientation control in thin films of a high-χ block copolymer with a surface active embedded neutral layer

Zhang, Jieqian, Clark, Michael, Wu, Chunyi, Li, Mingqi, Trefonas, Peter, Hustad, Phillip Dene

Journal:

Year:

2015

Language:

english

File:

PDF, 3.30 MB

english, 2015

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - New materials for directed self-assembly for advanced patterning

Wallow, Thomas I., Hohle, Christoph K., Zhang, Jieqian, Wu, Janet, Li, Mingqi, Ginzburg, Valeriy V., Weinhold, Jeffrey D., Clark, Michael B., Trefonas, Peter, Hustad, Phillip D.

Year:

2014

Language:

english

File:

PDF, 915 KB

english, 2014

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advanced Etch Technology for Nanopatterning III - A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly

Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Millward, Dan B., Lugani, Gurpreet S., Khurana, Ranjan, Light, Scott L., Niroomand, Ardavan, Hustad, Philip D., Trefonas, Peter, Chang, Shih-wei, Le

Year:

2014

Language:

english

File:

PDF, 1.38 MB

english, 2014

33

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process

Johnson, Jeffrey R., Stagaman, Gregory J., Sardella, John C., Spinner III, Charles R., Liou, Fu-Tai, Trefonas III, Peter, Meister, Catherine C., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 772 KB

english, 1993

34

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Positive Photoresist Development: A Multiple State Percolation Model

Trefonas III, Peter, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 596 KB

english, 1989

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Hohle, Christoph K., Younkin, Todd R., Siauw, Meiliana, Du, Ke, Valade, David, Trefonas, Peter, Thackeray, James W., Whittaker, Andrew, Blakey, Idriss

Year:

2016

Language:

english

File:

PDF, 719 KB

english, 2016

36

Multilayer Transfer Printing for Pixelated, Multi-Color Quantum Dot Light-Emitting Diodes

Kim, Bong Hoon, Nam, Sooji, Oh, Nuri, Cho, Seong-Yong, Yu, Ki Jun, Lee, Chi Hwan, Zhang, Jieqian, Deshpande, Kishori, Trefonas, Peter, Kim, Jae-Hwan, Lee, Jungyup, Shin, Jae Ho, Yu, Yongjoon, Lim, Jon

Journal:

Year:

2016

Language:

english

File:

PDF, 1.02 MB

english, 2016

37

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Performance of EUV photoresists on the ALS micro exposure tool

Koehler, Thomas, Sturtevant, John L., Brainard, Robert L., Naulleau, Patrick P., Van Steenwinckel, David, Lammers, Jeroen H., Goldberg, Kenneth A., Mackevich, Joseph F., Trefonas, Peter

Year:

2005

Language:

english

File:

PDF, 560 KB

english, 2005

38

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Practical resists for 193-nm lithography using 2.38% TMAH: physicochemical influences on resist performance

Szmanda, Charles R., Yu, Jaclyn J., Barclay, George G., Cameron, James F., Kavanagh, Robert J., Blacksmith, Robert F., Trefonas III, Peter, Taylor, Gary N., Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 618 KB

english, 1997

39

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Planarizing ARs for dual-damascene processing

Pavelchek, Edward K., Cernigliaro, Marjorie, Trefonas III, Peter, Kwok, Amy, Coley, Suzanne, Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 292 KB

english, 2001

40

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Dissolution inhibition of phenolic polymers: does a simple percolation field scaling law suffice?

Trefonas III, Peter, Vizvary, Gerald, Root, Jonathan C., Meister, Catherine C., Szmanda, Charles R., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 823 KB

english, 1994

41

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Highly regioselective PACs for i-line resist design: synthetic reaction model, dissolution kinetics and lithographic response

Pandya, Ashish, Trefonas III, Peter, Zampini, Anthony, Turci, Pamela, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 610 KB

english, 1994

42

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Profile defects in novolac/DNQ resists: I. formation of microgrooves

Trefonas III, Peter, Mirth, George P., Monaghan, Michael J., Turci, Pamela, DeJordy, L., Meister, Catherine C., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.09 MB

english, 1995

43

Large-Area, Nanometer-Scale Discrete Doping of Semiconductors via Block Copolymer Self-Assembly

Popere, Bhooshan C., Russ, Boris, Heitsch, Andrew T., Trefonas, Peter, Segalman, Rachel A.

Journal:

Advanced Materials Interfaces

Year:

2015

Language:

english

File:

PDF, 1.02 MB

english, 2015

44

Nanodomain analysis with cluster-SIMS: application to the characterization of macromolecular brush architecture

Yang, Fan, Cho, Sangho, Sun, Guorong, Verkhoturov, Stanislav V., Thackeray, James W., Trefonas, Peter, Wooley, Karen L., Schweikert, Emile A.

Journal:

Surface and Interface Analysis

Year:

2015

Language:

english

File:

PDF, 1.38 MB

english, 2015

45

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Exposure dose optimization for a positive resist containing polyfunctional photoactive compound

Trefonas III, Peter, Mack, Chris A., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 770 KB

english, 1991

46

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Methacrylate resists and antireflective coatings for 193-nm lithography

Taylor, Gary N., Trefonas III, Peter, Szmanda, Charles R., Barclay, George G., Kavanagh, Robert J., Blacksmith, Robert F., Joesten, Lori A., Monaghan, Michael J., Coley, Suzanne, Mao, Zhibiao, Cameron

Year:

1999

Language:

english

File:

PDF, 1.71 MB

english, 1999

47

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Planarization approaches to via-first dual-damascene processing

Pavelchek, Edward K., Cernigliaro, Marjorie, Trefonas III, Peter, doCanto, Manuel, Burnett, David, Kimura, Shin'ichiro, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 733 KB

english, 2000

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes

Erdmann, Andreas, Dusa, Mircea V., Conley, Will, Shao, Feng, Fuhrmann, Juergen, Fiebach, Andre, Patsis, George P., Trefonas, Peter

Year:

2010

Language:

english

File:

PDF, 1.72 MB

english, 2010

49

Opportunities and Challenges for Directed Self-Assembly for Advanced Patterning

Chang, Shih-Wei, Ginzburg, Valeriy V., Kramer, Johna W., Lee, Christopher, Li, Mingqi, Murray, Daniel J., Park, Jong, Roy, Raghunath, Sharma, Rahul, Trefonas III, Peter, Weinhold, Jeffrey D., Zhang, J

Journal:

Journal of Photopolymer Science and Technology

Year:

2013

Language:

english

File:

PDF, 971 KB

english, 2013

50

Modeling Chemoepitaxy of Block Copolymer Thin Films using Self-Consistent Field Theory

Ginzburg, Valeriy V., Weinhold, Jeffrey D., Hustad, Phillip D., Trefonas III, Peter

Journal:

Journal of Photopolymer Science and Technology

Year:

2013

Language:

english

File:

PDF, 487 KB

english, 2013

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